Double mirror structure for wavelength division multiplexing with polymer waveguides

ABSTRACT

Methods for wavelength filtering and structures for accomplishing the same. Wavelength filtering includes forming grooves in a waveguide to define angled surfaces in a path of the waveguide; forming a reflective layer on the angled surfaces; depositing cladding material on top of the waveguide and on the angled surfaces; forming a filter layer on an active region of an opto-electronic device, which transmits a single wavelength and reflects other wavelengths used; depositing the opto-electrical device on the cladding layer such that the filter layer is aligned with a point of incidence of a light beam reflected from the reflective layer; and electrically bonding the opto-electronic device to vias in the waveguide structure.

BACKGROUND

1. Technical Field

The present invention relates to fiber optics systems and, moreparticularly, to wavelength division multiplexing with polymerwaveguides.

2. Description of the Related Art

Optical data transfer is increasingly used in high-performancecomputing, where short-range optical communication provides a fast andlow power alternative to electrical communication. However, despitethese developments, new multi-core processing architectures demandhigher bandwidth and density. The number of channels needed to transferinformation is increasing rapidly. In the most advanced systems, morethan 60,000 individual fibers are used, so that practical physicallimits are being rapidly reached.

Efforts have been made to use a single fiber to carry multiple datasignals at different wavelengths. This increases the total bandwidth ofa system without a corresponding increase in the number of physicalchannels, but existing wavelength division multiplexing solutions aredifficult to implement on optical printed circuit board technology. Inone notable example, a dielectric minor is formed in a waveguide at aforty-five degree angle to the direction of transmission. The minor ismade to be selectively reflective, such that one wavelength is reflectedout of the waveguide path while the other wavelengths are passedthrough.

However, it is difficult to form such a reflector on a polymerwaveguide, it is difficult to form structures on a forty-five degreeangle due to shadow effects, and the reflector itself must be relativelythick due to a large polarization dependency that results from theforty-five degree angle of incidence.

SUMMARY

A wavelength filtering structure includes a first reflective surface,positioned at an end of a first waveguide section, that reflects a beamcomprising a plurality of wavelengths; a filter in the path of thereflected beam that allows a selected wavelength from the reflected beamto pass and that reflects all other wavelengths in a selected beam; anda second reflective surface, positioned adjacent to the first reflectivesurface and at an end of a second waveguide section, that reflects theselected beam into a core of the second waveguide section.

A wavelength division multiplexer/demultiplexer includes a plurality offiltering structures formed next to each other on a board, eachtransmitting a different wavelength from a beam comprising a pluralityof wavelengths. Each filtering structure includes a first reflectivesurface, positioned at an end of a first waveguide section, thatreflects the beam comprising a plurality of wavelengths, formed at anangle less than 45 degrees relative to a beam path and having a curve tocompensate for beam divergence; a filter in the path of the reflectedbeam that allows the selected wavelength from the reflected beam to betransmitted and that reflects all other wavelengths in a selected beam;and a second reflective surface, positioned adjacent to the firstreflective surface and at an end of a second waveguide section, thatreflects the selected beam to the end of the second waveguide section,formed at an angle less than 45 degrees relative to the beam path.

A method for forming a wavelength filtering structure includes forminggrooves in a waveguide to define angled surfaces in a path of thewaveguide; forming a reflective layer on the angled surfaces; depositingcladding material on top of the waveguide and on the angled surfaces;forming a filter layer on an active region of an opto-electronic device,which transmits a single wavelength and reflects other wavelengths used;depositing the opto-electrical device on the cladding layer such thatthe filter layer is aligned with a point of incidence of a light beamreflected from the reflective layer; and electrically bonding theopto-electronic device to vias in the waveguide structure.

These and other features and advantages will become apparent from thefollowing detailed description of illustrative embodiments thereof,which is to be read in connection with the accompanying drawings.

BRIEF DESCRIPTION OF DRAWINGS

The disclosure will provide details in the following description ofpreferred embodiments with reference to the following figures wherein:

FIG. 1 is a cross-sectional view of a section of a wavelengthdemultiplexer structure in accordance with the present principles;

FIG. 2 is a top-down and side view of a wavelength division multiplexingtransceiver in accordance with the present principles;

FIG. 3 is a cross-sectional view of a section of a wavelengthmultiplexer in accordance with the present principles;

FIG. 4 is a cross-sectional view of a curved minor structure inaccordance with the present principles;

FIG. 5 is a top-down view of waveguides in accordance with the presentprinciples;

FIG. 6 is a cross-sectional view of a waveguide focusing element inaccordance with the present principles;

FIG. 7 is a cross-sectional view of a step in forming a wavelengthfilter structure in accordance with the present principles;

FIG. 8 is a cross-sectional view of a step in forming a wavelengthfilter structure in accordance with the present principles;

FIG. 9 is a cross-sectional view of a step in forming a wavelengthfilter structure in accordance with the present principles;

FIG. 10 is a cross-sectional view of a step in forming a wavelengthfilter structure in accordance with the present principles;

FIG. 11 is a cross-sectional view of a step in forming a wavelengthfilter structure in accordance with the present principles;

FIG. 12 is a block/flow diagram of a method of forming a wavelengthfilter structure in accordance with the present principles; and

FIG. 13 is a cross-sectional view of geometric relationships in awavelength filter structure in accordance with the present principles.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

Embodiments of the present invention provide wavelength divisionmultiplexing (WDM) in a polymer waveguide structure having an array ofcores with a high density. The present embodiments use a double mirrorstructure with a dielectric filter deposited on an opto-electronicdevice array or on the top cladding to form wavelength filters. Althoughit is specifically contemplated that polymer waveguides be used in thepresent embodiments, it should be recognized that the present principlesmay be readily extended to other types of waveguide. Polymer waveguidesand micromirrors guide the light from laser arrays with a high density,for example a 125 um core pitch. The signals from a board can be sentdirectly to another board via polymer waveguides for short rangeintegrated data transfer, or can be coupled to a fiber ribbon for longerrange data transfer.

Referring now to the drawings in which like numerals represent the sameor similar elements and initially to FIG. 1, a WDM mirror structure isshown. A waveguide core layer 102 is formed with an upper cladding 106and a lower cladding 108. The waveguide carries a beam 104 that includesseveral different wavelengths. In the present examples the beam 104 isdescribed with respect to four wavelengths, λ₁, λ₂, λ₃, and λ4, but itis contemplated that any number of mutually non-interfering wavelengthsmay be used.

In a receiver configuration, the beam 104 is reflected by a two-sidedminor structure 110 at an angle of incidence larger than forty-fivedegrees. The mirror structure 110 may be formed with a surface of goldor some other appropriate reflective material that has little loss atthe wavelengths of the beam 104. The beam 104 then exits the plane ofthe waveguide 102 through the upper cladding 106 to reach a dielectricfilter 112. The dielectric filter is transparent to only one of thewavelengths, e.g., λ₁, which reaches a detector device 114. Theremaining wavelengths are reflected from the dielectric filter 112,reflect off of mirror 110, and reenter the waveguide 102. It isanticipated that the detector 114 may send an electrical signalcorresponding to the received light through electrical via 116, but itshould be understood that additional processing may occur as well andother electrical contact configurations such as a planar line on top ofthe clad layer 106 are also possible.

It is to be understood that the present invention will be described interms of a given illustrative architecture having a laminar substrateand waveguide-integrated organic carrier; however, other architectures,structures, substrate materials and process features and steps may bevaried within the scope of the present invention.

It will also be understood that when an element such as a layer, regionor substrate is referred to as being “on” or “over” another element, itcan be directly on the other element or intervening elements may also bepresent. In contrast, when an element is referred to as being “directlyon” or “directly over” another element, there are no interveningelements present. It will also be understood that when an element isreferred to as being “connected” or “coupled” to another element, it canbe directly connected or coupled to the other element or interveningelements may be present. In contrast, when an element is referred to asbeing “directly connected” or “directly coupled” to another element,there are no intervening elements present.

A design for a polymer waveguide may be created in a graphical computerprogramming language, and stored in a computer storage medium (such as adisk, tape, physical hard drive, or virtual hard drive such as in astorage access network). If the designer does not fabricate waveguidesor the photolithographic masks used to fabricate waveguides, thedesigner may transmit the resulting design by physical means (e.g., byproviding a copy of the storage medium storing the design) orelectronically (e.g., through the Internet) to such entities, directlyor indirectly. The stored design is then converted into the appropriateformat (e.g., GDSII) for the fabrication of photolithographic masks,which typically include multiple copies of the design in question thatare to be formed on a polymer substrate. The photolithographic masks areutilized to define areas of the substrate (and/or the layers thereon) tobe etched or otherwise processed.

Reference in the specification to “one embodiment” or “an embodiment” ofthe present principles, as well as other variations thereof, means thata particular feature, structure, characteristic, and so forth describedin connection with the embodiment is included in at least one embodimentof the present principles. Thus, the appearances of the phrase “in oneembodiment” or “in an embodiment”, as well any other variations,appearing in various places throughout the specification are notnecessarily all referring to the same embodiment.

It is to be appreciated that the use of any of the following “/”,“and/or”, and “at least one of”, for example, in the cases of “A/B”, “Aand/or B” and “at least one of A and B”, is intended to encompass theselection of the first listed option (A) only, or the selection of thesecond listed option (B) only, or the selection of both options (A andB). As a further example, in the cases of “A, B, and/or C” and “at leastone of A, B, and C”, such phrasing is intended to encompass theselection of the first listed option (A) only, or the selection of thesecond listed option (B) only, or the selection of the third listedoption (C) only, or the selection of the first and the second listedoptions (A and B) only, or the selection of the first and third listedoptions (A and C) only, or the selection of the second and third listedoptions (B and C) only, or the selection of all three options (A and Band C). This may be extended, as readily apparent by one of ordinaryskill in this and related arts, for as many items listed.

Referring now to FIG. 2, a WDM transceiver is shown. A WDM demultiplexeris made out of four photodetector arrays 202 that receive light from thewaveguide array 206, each core initially carrying four differentwavelengths. The wavelength-specific filters 208 each transmit only oneof the wavelengths and reflect the others, such that the fourth andfinal filter 208 transmits the final remaining wavelength. Aftertransmission through the filters, light from each core reaches theactive regions of a detector. In a preferred embodiment, the detectorsare semiconductor photodiode arrays electrically linked to atrans-impedance limiting amplifier integrated circuit.

A WDM multiplexer 204 has the reverse light path from the WDMdemultiplexer, with the four wavelength-specific filters 210 on top of asecond waveguide array 206. Each of the filters 210 transmits light atone of the four wavelengths and reflects light at the other wavelengths.It should be noted that the number of wavelengths could be smaller orgreater than four for the multiplexer and the demultiplexer.

In one exemplary embodiment, the demultiplexer 202 may receive lightsignals at the wavelengths 850 nm, 980 nm, 1020 nm, and 1060 nm. At thefirst wavelength-specific filter 208, the 850 nm wavelength may betransmitted, leaving the 980 nm, 1020 nm, and 1060 nm light signals tobe reflected back inside the waveguides 206. Similarly, the secondwavelength-specific filter 208 transmits the 980 nm light signal andreflects the 1020 nm and 1060 nm light signals. The third filter 208transmits 1020 nm, and the final light signal at 1060 nm is transmittedto the photodiode 204. Conversely, for the multiplexer, thewavelength-specific filters 210 combine the light signals at the fourwavelengths emitted from the laser arrays 204, which emit light at 850,980, 1020 and 1060 nm respectively.

A cross-sectional side view is also shown that illustrates each of thefilters 208 as including a detector device 114 and a mirror structure110. The actual filter 112 is very small relative to the size of thedevice 114 and the minor structure 110 and is not shown here for thesake of simplicity.

Referring now to FIG. 3, a wavelength-specific transmitter is shown. Anelectrical signal reaches the emitter device 302 from an electrical via116 or other electrical configuration so that the emitter 304 emitslight at a specified wavelength. The emitter 304 is specificallycontemplated as being a vertical cavity surface emitting laser (VCSEL)array, though it is contemplated that other emitters might also beemployed. The filter 112 is transparent to the emission wavelength ofthe emitter 304 directly above it, but reflects light coming from themirror 110 and emitted by the other emitters 304. The combined lightsignal re-enters the waveguide core 104. As VCSELs emit lightperpendicular to their surface, a slight coupling loss may occur as thelight beam enters the waveguide core after reflection from the mirror110. However, this loss is typically small and the VCSEL active area hasa diameter smaller than the beam, typically in the range of about 3μ toabout 8μm. As an alternative embodiment, an asymmetric lens may befabricated on the emitter 304 to make the emitted light beam 306parallel to the other beam 104.

One potential difficulty with the double-mirror structures describedabove can be found in the fact that the beams 104 will have a smalldivergence angle as they exit the waveguide 102, resulting in somecoupling loss. The beams 104 may be propagated for a distance of, e.g.,200 μm before reentering the waveguide 102. The mirror structure 110 andthe ends of the waveguides 102 may be formed to accommodate and correctfor these losses.

Referring now to FIG. 4 a modified double minor structure is shown. Incontrast to the mirror-structure 110 shown above, which has flat sides,the modified minor structure 402 has at least one curved side. The curvemay, for example, be along a single axis or may be a paraboloid shape.Only one face of the modified mirror structure 402 needs to be curved,and the curved face should preferably be the one on which light comingout of the waveguide is first reflected.

A single-axis curve, as shown, is easier to fabricate but can onlycorrect for divergence in one direction, while a parabolic or ellipticalminor will be able to collimate light in both directions but will bemore difficult to fabricate. To account for the second axis ofdivergence when using a single-axis curved minor 402, the waveguides 102may be tapered, both before and after the beam is reflected on themirror 402.

Referring now to FIG. 5, tapered waveguides to compensate for planarbeam divergence are shown. The core of the waveguide 502 from whichlight is coming becomes smaller closer to the curved minor structure402, decreasing the beam size before it is reflected. After the beam isreflected by the second surface of the minor structure 402, it re-entersthe waveguide 504. The core of the waveguide 504 is widened so that ahigher portion of the diverging light beam can be guided into the core.The core size is gradually decreased to its initial standard value. Thecombination of smaller core size on one side of the waveguide and largersize on the other helps to minimize loss due to beam divergence in theplane of the waveguides.

Referring now to FIG. 6, an alternative embodiment is shown that uses afocusing element 602 that is separate from the mirror structure 110. Inthis embodiment a portion of the waveguide 102 near the minor structure110 is removed to make space for a lens array 602. This lens array 602may be a single unit that is inserted across multiple waveguides 102 andcan be made, for example, from glass or polymer.

Referring now to FIG. 7, a step in creating a WDM minor structure isshown. A lower cladding 704 and a polymer waveguide material 706 areformed on a substrate 702. The waveguide material 706 is deposited in alayer and a core pattern is formed by using a lithography technique orother optical method to slightly alter the refractive index of thematerial. The substrate may be, for example, an FR4-grade board formedfrom glass-reinforced epoxy laminate sheets, but it is contemplated thatany appropriate material may be used instead.

Referring now to FIG. 8, a step in creating a WDM minor structure isshown. Two grooves 802 are formed in the waveguide material 706 for eachwavelength expected in beam 104. The grooves 802 are formed such that ashallow-angled surface is formed, having an angle of less thanforty-five degrees. A reflecting layer 804 is deposited on the surfacesof the remaining waveguide material 706 forming the bottom of thegrooves 802. The reflector 804 may be formed from, e.g., gold or anyother suitable material that will reflect all operation wavelengths. Toform the reflector 804, a mask may be positioned over the waveguidematerial 706 to expose only the grooves 802 and the reflective materialmay be deposited using one of, e.g., evaporation, sputtering, atomiclayer deposition, chemical vapor deposition, etc.

Referring now to FIG. 9, an additional cladding layer 902 is depositedon top of the core layers and in the grooves. Vias 904 are created thatgo through the cladding 704/902. The vias 904 are formed by drilling oretching holes in the cladding 704/902 using a method such as, e.g.,laser drilling. A conductor is then deposited in the holes, creating aconductive link between the top of the cladding and the board underneaththe bottom cladding layer.

Referring now to FIG. 10, an opto-electronic device 1002 is formedseparately. As described above, the device 1002 may be a detector or alaser array (e.g., a semiconductor photodiode array and a VCSEL array)for a specific wavelength. The device 1002 has metal pads 1004 and anactive region 1006 to emit or absorb light. A filter 1008 is depositedon the active region 1006 and is transparent to one of the wavelengthsexpected in beam 104. The filter 1008 therefore allows the selectedwavelength to be transmitted to or from the device active region 1006and reflects the other wavelengths. The filter 1008 may be, for example,a distributed Bragg reflector or some other photonic crystal structureformed using, e.g., a quarter wave stack of two dielectric materialssuch as SiO₂/TiO₂ deposited by evaporation. Semiconductor materials orother types of filters, such as colored glass, can also be used.

Referring now to FIG. 11, the opto-electronic device 1002 is flip-bondedto the upper cladding 902 and electrical contact using, for example, C4bonding. The electrical device 1002 is positioned such that the metalpads 1004 align with the via 904 and the filter 1008 is over thereflector 804. The specific alignment of the filter 1008 and thereceiver/transmitter 1006 with respect to the reflector 804 will varydepending on whether the opto-electronic device 1002 is a detector, inwhich case the receiver 1006 will be aligned with the reflected beam, oras a transmitter, in which case the transmitter may be slightlyoff-center to minimize the coupling loss with a waveguide core 706. Itshould be noted that the present figures are not drawn to scale—thethickness of the filter 1008 may be about 2-5 μm thick, which isnegligible compared to the process variation of the cladding surface.

Referring now to FIG. 12, a block/flow diagram of the fabrication of adouble minor WDM structure is shown. In block 1202, a lower cladding 704is deposited on a board 702. The core layer 706 is then deposited, andthe cores are formed using lithography or other technique. In block1204, grooves 802 at a shallow angle are formed in the waveguidematerial 706 to produce a double-sided structure. In block 1206, a layer804 is deposited in the grooves by, e.g., evaporation or other techniquethat is reflective at all the operation wavelengths. In block 1208, anupper cladding 902 is deposited on top of the reflector 708 and corelayer 706. In block 1210, vias 904 are formed by drilling or etching ahole in the waveguide layers 902/706/704 and filling the hole with aconductive material.

In block 1212, a filter 1108 is deposited on the active region of alaser or detector array 1006. The filter 1008 is transparent to onespecific wavelength out of the operating wavelengths, such that anyother wavelength is reflected. In block 1214, the emitter/receiver 1002is flip-chip bonded to the upper cladding 902 such that the filter 1008is positioned over the reflector 804 and the device 1002 is electricallyconnected to the vias 904.

Referring now to FIG. 13, the upper cladding layer 902 is shown withdimensional considerations. The thickness of the upper cladding layer902, as well as the unguided light path length depends on the dimensionsof the reflector 804. In particular, the height h of the cladding layer902 can be expressed as h=d/2 tan(θ), where d is the horizontal distancebetween the beam incident on the reflector 804 and the beam reflected asecond time from the reflector 804, measured from the middle of therespective beams and θ is the angle of incidence of the reflected beamat the top of the cladding layer 902. θ is determined by the angle ofthe reflector 804 as θ=90°−2α, where α is the angle between the surfaceof the reflector 804 and the plane of the waveguide core. A minimumvalue for d, and hence for h, may be determined as d_(min)=w/tan(α),where w is the beam width and is related to the size of the waveguidecore size.

Having described preferred embodiments of a double-minor structure forWDM with polymer waveguides and methods of forming the same (which areintended to be illustrative and not limiting), it is noted thatmodifications and variations can be made by persons skilled in the artin light of the above teachings. It is therefore to be understood thatchanges may be made in the particular embodiments disclosed which arewithin the scope of the invention as outlined by the appended claims.Having thus described aspects of the invention, with the details andparticularity required by the patent laws, what is claimed and desiredprotected by Letters Patent is set forth in the appended claims.

1. A wavelength filtering structure, comprising: a first reflectivesurface having a curve along a single axis to compensate for beamdivergence in a single dimension, positioned at an end of a firstwaveguide section that is tapered relative to a carrying width of thefirst waveguide section, that reflects a beam comprising a plurality ofwavelengths; a filter in the path of the reflected beam that allows aselected wavelength from the reflected beam to pass and that reflectsall other wavelengths in a selected beam; and a second reflectivesurface, positioned adjacent to the first reflective surface and at anend of a second waveguide section, that reflects the selected beam intoa core of the second waveguide section.
 2. The wavelength filteringstructure of claim 1, wherein the first and second reflective surfacesare formed at an angle relative to the beam path.
 3. The wavelengthfiltering structure of claim 2, wherein the first and second reflectivesurfaces are formed at an angle less than 45 degrees relative to thebeam path.
 4. The wavelength filtering structure of claim 1, furthercomprising a photodetector configured to receive the selected wavelengththat passes through the filter.
 5. The wavelength filtering structure ofclaim 1, further comprising an emitter configured to emit the selectedwavelength through the filter.
 6. The wavelength filtering structure ofclaim 5, wherein the emitter comprises a lens configured to orient theemitted light in a direction parallel to the existing beam.
 7. Thewavelength filtering structure of claim 5, wherein the emitter is set ata non-zero lateral distance from a point of incidence on the filterwhere the reflected beam hits.
 8. The wavelength filtering structure ofclaim 7, wherein the emitted wavelength reflects from the second mirrorto enter the second waveguide section.
 9. The wavelength filteringstructure of claim 1, further comprising a focusing element at an end ofthe first waveguide section configured to compensate for beamdivergence. 10-12. (canceled)
 13. A wavelength divisionmultiplexer/demultiplexer, comprising: a plurality of filteringstructures formed next to each other on a board, each transmitting adifferent wavelength from a beam comprising a plurality of wavelengths,each filtering structure comprising: a first reflective surface,positioned at an end of a first waveguide section that is taperedrelative to a carrying width of the first waveguide section, thatreflects the beam comprising a plurality of wavelengths, formed at anangle less than 45 degrees relative to a beam path and having a curvealong a single axis to compensate for beam divergence; a filter in thepath of the reflected beam that allows the selected wavelength from thereflected beam to be transmitted and that reflects all other wavelengthsin a selected beam; and a second reflective surface, positioned adjacentto the first reflective surface and at an end of a second waveguidesection, that reflects the selected beam to the end of the secondwaveguide section, formed at an angle less than 45 degrees relative tothe beam path.
 14. A method for forming a wavelength filteringstructure, comprising: forming a waveguide having a first section thattapers in a first dimension and a second section that is widened in thefirst dimension relative to a carrying width of the respective waveguidesections; forming grooves in the waveguide to define angled surfaces ina path of the waveguide, wherein one of said grooves is formed with acurve along a single axis of one of the angled surfaces to compensatefor beam divergence in a second dimension; forming a reflective layer onthe angled surfaces; depositing cladding material on top of thewaveguide and on the angled surfaces; forming a filter layer on anactive region of an opto-electronic device, which transmits a singlewavelength and reflects other wavelengths used; depositing theopto-electrical device on the cladding layer such that the filter layeris aligned with a point of incidence of a light beam reflected from thereflective layer; and electrically bonding the opto-electronic device tovias in the waveguide structure.
 15. The method of claim 14, whereinforming grooves comprises forming the angled surfaces at an angle lessthan 45 degrees relative to a waveguide axis.
 16. The method of claim14, wherein the opto-electronic device comprises a photodetectorconfigured to receive the selected wavelength that passes through thefilter and wherein said step of bonding comprises bonding a surface ofthe electrical device having said photodetector to the cladding layersuch that the photodetector is aligned with a point of incidence of abeam.
 17. The method of claim 14, wherein the opto-electronic devicecomprises an emitter configured to emit the selected wavelength throughthe filter and wherein said step of bonding comprises bonding a surfaceof the electrical device having said emitter to the cladding layer suchthat the emitter is set to a non-zero lateral distance from a point ofincidence of a beam. 18-20. (canceled)